Building Filters
MDXN-31D2 Mask aligner
5.exposure type: capacidad del tanque de gas LP | 6.exposure area: φ100mm; | 7.uneven exposure: ≤±3%; | 8.exposure intensity: ≥5mw/cm2; | 9.exposure resolution: 2μm; | 10.exposure mode: Exposición simultánea en d...
Cantón, ChinaMDXN-31D4 High precision double-sided lithography machine
1. exposure type: contact type, plate alignment, double-sided single exposure | 2. exposure area: 110X110mm; | 3. exposure uniformity: ≥ 97%; | 4. exposure intensity: 0-30mw/cm2 adjustable; | 5. uv beam angle: ≤ ...
Cantón, ChinaMDXN-25D Mask aligner
1.exposure type: lado único. | 2.exposure area: 110×110 mm. | 3.uneven exposure illumination: ≤±3%. | 4.exposure intensity: 0-30 mW/cm2 ajustable. | 5.uv beam angle: ≤3°. | 6.central wavelength of ultraviolet lig...
Cantón, ChinaMDXN-25D4 High precision mask aligner
1. exposure type: single side exposure | 2. exposure area: 110X110mm; | 3. exposure uniformity: ≥ 97%; | 4. exposure intensity: 0-30mw/cm2 adjustable; | 5. uv beam angle: ≤ 3 ° | 6. central wavelength of ultravio...
Cantón, ChinaMDXN-25X High precision single side lithography machine
Light source: GCQ350Z ultra-high pressure mercury direct current mercury lamp is used. | Lighting range: ≤ ф 117mm | Exposure area: ф 100mm | A. hard contact exposure: Use pipeline vacuum to obtain high vacuum co...
Cantón, China